CYLINDRICAL HOT REFRACTORY ANODE VACUUM ARC (CHRAVA),
I. CAMPS, S. MUHL, E. CAMPS,
REVIEW OF SCIENTIFIC INSTRUMENTS 89, 095109 (2018). (IMPACT FACTOR 1.428)

Al-Si-N THIN FILMS DEPOSITED BY LASER ABLATION: EFFECT OF PLASMA PARAMETERS ON MECHANICAL AND OPTICAL PROPERTIES,
L.P. RIVERA, E. CAMPS, S. MUHL, R. BASURTO, A. ZEINERT,
MATERIALS RESEARCH BULLETIN 99, 2018, 306-313. (IMPACT FACTOR 2.45)

TRIBOLOGICAL, TRIBOCORROSION AND WEAR MECHANISM STUDIES OF TaZrN COATINGS DEPOSITED BY MAGNETRON SPUTTERING ON TiAlV ALLOY,
E. GARCÍA, M. FLORES, E. RODRÍGUEZ, L. P. RIVERA, E. CAMPS, S. MUHL,
COATINGS 2018, 8(9), 295-310. (IMPACT FACTOR 2.35)

TRIBOLOGICAL STUDY OF A MONO AND MULTILAYER COATING OF TaZrN/TaZr PRODUCED BY MAGNETRON SPUTTERING ON AISI-316L STAINLESS STEEL,
C. HERNÁNDEZ-NAVARRO, L.P. RIVERA, M. FLORES-MARTÍNEZ, E. CAMPS, S. MUHL, E. GARCÍA,
TRIBOLOGY INTERNATIONAL, VOLUME 131, 2019, 288-298. (IMPACT FACTOR 3.246)

METHODOLOGY AND FABRICATION OF ADHERENT AND CRACK-FREE SU-8 PHOTORESIST-DERIVED CARBON MEMS ON FUSED SILICA TRANSPARENT SUBSTRATES,
PILLONI, O.; MADOU, M.; MENDOZA, D.; MUHL, S.; OROPEZA-RAMOS, L.,
J. OF MICROMECHANICS AND MICROENGINEERING, 29 (2) 2019, 027002. (IMPACT FACTOR 2.141)

STRUCTURAL, CHEMICAL AND MECHANICAL STUDY OF TIALV FILM ON UHMWPE PRODUCED BY DC MAGNETRON SPUTTERING,
BERUMEN, J. O., DE LA MORA, T., LOPEZ-PERRUSQUIA, N., JIMENEZ-PALOMAR, I., MUHL, S., HERNANDEZ-NAVARRO, C., GARCIA, E.,
J. OF THE MECHANICAL BEHAVIOUR OF BIOMEDICAL MATERIALS 93 (2019) 23-30. (IMPACT FACTOR 3.485)

MULTIPASS AND RECIPROCATING MICROWEAR STUDY OF TIN BASED FILMS,
R.C. MORÓN, G.A. RODRÍGUEZ-CASTRO, D.V. MELO-MÁXIMO, J. OSEGUERA, A. BAHRAMIC, S. MUHL, I. ARZATE-VÁZQUEZ,
SURFACE & COATINGS TECHNOLOGY 375 (2019) 793-801. (IMPACT FACTOR 3.192).

STRUCTURE, MECHANICAL PROPERTIES AND CORROSION RESISTANCE OF AMORPHOUS TI-CR-O COATINGS,
A. BAHRAMI, A. DELGADO, C. ONOFRE, S. MUHL, S. E RODIL,
SURFACE & COATINGS TECHNOLOGY, 374, 2019, 690-699. (IMPACT FACTOR 3.192)

HYBRID MAGNETRON SPUTTERING AND PULSED LASER ABLATION FOR THE DEPOSITION OF COMPOSITE ZNO-AU FILMS,
O. DEPABLOS-RIVERA, C. SÁNCHEZ-AKÉ, R. ÁLVAREZ-MENDOZA, T. GARCÍA-FERNÁNDEZ, S. MUHL, M. VILLAGRÁN-MUNIZ,
THIN SOLID FILMS, 685, 2019, 66-74. (IMPACT FACTOR: 1.79)

STUDY OF C, AL, SI AND GE SPUTTERING YIELD AMPLIFICATION BY ION BEAM ANALYSIS AND CO-SPUTTERING SIMULATION SOFTWARE,
J. CRUZ, S. MUHL, E. ANDRADE AND O. G. DE LUCIO,
J. OF PHYSICS D: APPLIED PHYSICS, 52 (40) 2019 405202 (7 PAGES). (IMPACT FACTOR 2.109)

MODELLING THE THICKNESS DISTRIBUTION OF SILICON OXIDE THIN FILMS GROWN BY REACTIVE MAGNETRON SPUTTERING,
J. C. CRUZ CÁRDENAS, R. SANGINES, N. ABUNDIZ, J. ÁGUILA MUÑOZ, S. MUHL, R. MACHORRO MEJÍA,
J. OF PHYSICS D: APPLIED PHYSICS 52 (49) 2019 495201. (IMPACT FACTOR 2.109)